A Multi-objective Optimization Framework for Robust IC Parametric Yield Predication Under Process Variations

LI Xin, SUN Jin, XIAO Fu, TIAN Jiang-shan

ACTA ELECTRONICA SINICA ›› 2016, Vol. 44 ›› Issue (12) : 2960-2966.

PDF(626 KB)
CIE Homepage  |  Join CIE  |  Login CIE  |  中文 
PDF(626 KB)
ACTA ELECTRONICA SINICA ›› 2016, Vol. 44 ›› Issue (12) : 2960-2966. DOI: 10.3969/j.issn.0372-2112.2016.12.021

A Multi-objective Optimization Framework for Robust IC Parametric Yield Predication Under Process Variations

    {{javascript:window.custom_author_en_index=0;}}
  • {{article.zuoZhe_EN}}
Author information +

HeighLight

{{article.keyPoints_en}}

Abstract

{{article.zhaiyao_en}}

Key words

QR code of this article

Cite this article

EndNote

Ris (Procite)

Bibtex

Download Citations
{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2016, 44(12): 2960-2966. https://doi.org/10.3969/j.issn.0372-2112.2016.12.021

References

Publishing order | Descend order by publishing year | Descend order by cited within

References

{{article.reference}}

Funding

RIGHTS & PERMISSIONS

{{article.copyrightStatement_en}}
{{article.copyrightLicense_en}}
PDF(626 KB)

Accesses

Citation

Detail
Sections
Recommended
Copyright © ACTA ELECTRONICA SINICA, All Rights Reserved.
E-mail：new@ejournal.org.cn
Powered by Beijing Magtech Co. Ltd,.
Copyright © ACTA ELECTRONICA SINICA, All Rights Reserved.

/

〈 〉