A Comprehensive Abatement Technology for Arsine,Phosphorus, Sulfur,Fluorine,Chlorine,Oxynitrides and Heavy Metals in Semiconductor Industry Waste Water and Gases

A Comprehensive Abatement Technology for Arsine,Phosphorus, Sulfur,Fluorine,Chlorine,Oxynitrides and Heavy Metals in Semiconductor Industry Waste Water and Gases

WEN Rui-mei

ACTA ELECTRONICA SINICA ›› 2000, Vol. 28 ›› Issue (11) : 1-3.

PDF(253 KB)

PDF(253 KB)

ACTA ELECTRONICA SINICA ›› 2000, Vol. 28 ›› Issue (11) : 1-3.

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A Comprehensive Abatement Technology for Arsine,Phosphorus, Sulfur,Fluorine,Chlorine,Oxynitrides and Heavy Metals in Semiconductor Industry Waste Water and Gases

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2000, 28(11): 1-3.

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