Investigation of Radiation and Capture Process of Resonance Xenon in Novel SMPDP Discharge Cell

TU Yan;ZHANG Xiong;WANG Bao-ping;YIN Han-chun;TONG Lin-su

ACTA ELECTRONICA SINICA ›› 2004, Vol. 32 ›› Issue (3) : 512-515.

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ACTA ELECTRONICA SINICA ›› 2004, Vol. 32 ›› Issue (3) : 512-515.
论文

Investigation of Radiation and Capture Process of Resonance Xenon in Novel SMPDP Discharge Cell

  • TU Yan, ZHANG Xiong, WANG Bao-ping, YIN Han-chun, TONG Lin-su
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Abstract

On the basis of our fluid model calculation,the Monte Carlo method is used to investigate the resonance radiation and imprison process of resonance photons.The characteristics of discharge,radiation and imprison of resonance photons are calculated for both shadow mask PDP (SMPDP) and AC coplanar PDP (ACC PDP) respectively. The temporal variance of average density and density distribution of electron and resonance Xenon are shown.The distribution and number of photons arriving at each wall of the cell is simulated.The spectrum distribution of 147nm vacuum ultraviolet for different structure is also calculated.It can be seen that the efficiency of SMPDP is larger than that of ACC PDP.

Key words

shadow mask PDP(SMPDP) / AC Coplanar PDP(ACC PDP) / radiation and capture / Monte Carlo method

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TU Yan;ZHANG Xiong;WANG Bao-ping;YIN Han-chun;TONG Lin-su. Investigation of Radiation and Capture Process of Resonance Xenon in Novel SMPDP Discharge Cell[J]. Acta Electronica Sinica, 2004, 32(3): 512-515.
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