The Removal of Silicon and Boron in Ultra-Pure Water for Semiconductor Processes

The Removal of Silicon and Boron in Ultra-Pure Water for Semiconductor Processes

WEN Rui-mei;DENG Shou-quan;ZHANG Ya-feng;GE Wei-wei

Acta Electronica Sinica ›› 2005, Vol. 33 ›› Issue (2) : 197-199.

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PDF(131 KB)

Acta Electronica Sinica ›› 2005, Vol. 33 ›› Issue (2) : 197-199.

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The Removal of Silicon and Boron in Ultra-Pure Water for Semiconductor Processes

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2005, 33(2): 197-199

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