A Two Dimensional Dynamic Cellular Automata Model for Simulation of Photoresist Etching Process

A Two Dimensional Dynamic Cellular Automata Model for Simulation of Photoresist Etching Process

ZHOU Zai-fa, HUANG Qing-an, LI Wei-hua, LU Wei

ACTA ELECTRONICA SINICA ›› 2006, Vol. 34 ›› Issue (5) : 906-910.

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PDF(476 KB)

ACTA ELECTRONICA SINICA ›› 2006, Vol. 34 ›› Issue (5) : 906-910.

A Two Dimensional Dynamic Cellular Automata Model for Simulation of Photoresist Etching Process

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2006, 34(5): 906-910.

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