Process Monitor of Plasma Charging Damage in Ultra-Thin Gate Oxide

Process Monitor of Plasma Charging Damage in Ultra-Thin Gate Oxide

ZHAO Wen-bin;LI Lei-lei;YU Zong-guang

ACTA ELECTRONICA SINICA ›› 2009, Vol. 37 ›› Issue (5) : 947-950.

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PDF(395 KB)

ACTA ELECTRONICA SINICA ›› 2009, Vol. 37 ›› Issue (5) : 947-950.

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Process Monitor of Plasma Charging Damage in Ultra-Thin Gate Oxide

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2009, 37(5): 947-950.

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