A Thin Tantalum Interlayer on the Thermal Stability and Electrical of NiSi Film

A Thin Tantalum Interlayer on the Thermal Stability and Electrical of NiSi Film

HUANG Wei;ZHANG Shu-dan;XU Ju-yan

ACTA ELECTRONICA SINICA ›› 2011, Vol. 39 ›› Issue (11) : 2502-2506.

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PDF(693 KB)

ACTA ELECTRONICA SINICA ›› 2011, Vol. 39 ›› Issue (11) : 2502-2506.

A Thin Tantalum Interlayer on the Thermal Stability and Electrical of NiSi Film

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2011, 39(11): 2502-2506.

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