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1. 清华大学电子工程系,北京,100084
2. 大连铁道学院电信分院,大连,11602
3. 清华大学电子工程系北京,100084
4. 大连铁道学院电信分院大连,11602
Published:2000
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QU Xiao-sheng, LI De-jie, TIAN Hong, et al. Self-adjustment Technique in Fabricating FFEA[J]. Acta Electronica Sinica, 2000, 28(12): 29-30.
本文讨论了制造Spindt型聚焦场发射阵列FFEA过程中需要的对准技术
提出了具有自对准能力的刻蚀方法
满足了聚焦型发射阵列的聚焦极与门极的精确对准.比较了传统方法与新方法的不同
具体论述了整个工艺过程
并对制备出的器件进行了SEM观测
结果达到了预想的目标.
This paper discussed the technique of self-adjustment for focusing field emission arrays (FFEA).This method made etch gate and focus electrode in FEA very precise for fabrication of Spindt type FFEA.The difference between traditional way and self-adjustment way is pointed in the paper.For ensuring that the hole of focus electrode is precisely made
we developed transparent resistor layer with Ni-SiO2.A typical device has been developed
with focus electrode made by the technique of self-adjustment.
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