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1. 重庆大学光电工程学院,重庆,400044
2. 国家模拟集成电路重点实验室,重庆,400060
3. 重庆大学光电工程学院重庆,400044
4. 国家模拟集成电路重点实验室重庆,400060
Published:2003
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ZHANG Zheng-yuan, WEN Zhi-yu, XU Shi-lu, et al. Research for RF Micromechanical CPW Switch[J]. Acta Electronica Sinica, 2003, 31(5): 671-673.
DOI:
ZHANG Zheng-yuan, WEN Zhi-yu, XU Shi-lu, et al. Research for RF Micromechanical CPW Switch[J]. Acta Electronica Sinica, 2003, 31(5): 671-673. DOI:
本文采用聚酰亚胺牺牲层技术和二氧化硅介质隔离技术
成功地在绝缘多晶硅衬底上研制出一种射频微机械CPW开关.初步测试结果如下:开态电容为0.21pF
关态电容为6.1pF
致动电压为22V
关态下的隔离度为35dB
开态下插入损耗为3dB.该工艺完全与硅基IC工艺兼容
这为射频微机械CPW开关与IC实现单片集成化
降低体积提高可靠性打下了基础.
An RF micromechanical CPW switch on the isolation polysilicon has been developed by using polymide sacrificial layer
and by dielectric isolating technology.The preliminary test results are as follows:the Coff and Con are 0.21pF
6.1pF respectively;the actuated voltage is 22V.The isolation is 35dB in the off state
and insertion loss is 3dB in the on state.The process is compatible with silicon IC
so is the basis of monolithically integrating RF micromechanical switch and IC for high reliability and low volume.
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