您当前的位置:
首页 >
文章列表页 >
Numerical Simulation and Experimental Study of Photo-Bidirectional Negative Resistance Transistor
更新时间:2025-07-16
    • Numerical Simulation and Experimental Study of Photo-Bidirectional Negative Resistance Transistor

    • Acta Electronica Sinica   Vol. 32, Issue 8, Pages: 1260-1263(2004)
    • CLC: TN364+.3
    • Published:2004

    移动端阅览

  • MO Tai-shan, ZHANG Shi-lin, GUO Wei-lian, et al. Numerical Simulation and Experimental Study of Photo-Bidirectional Negative Resistance Transistor[J]. Acta Electronica Sinica, 2004, 32(8): 1260-1263. DOI:

  •  
  •  
icon
试读结束,您可以激活您的VIP账号继续阅读。
去激活 >
icon
试读结束,您可以通过登录账户,到个人中心,购买VIP会员阅读全文。
已是VIP会员?
去登录 >

0

Views

846

下载量

0

CSCD

Alert me when the article has been cited
提交
Tools
Download
Export Citation
Share
Add to favorites
Add to my album

Related Articles

BEM Numerical Simulation of High Voltage MZ-JTE
Two Dimensional Numerical Simulation of Deep Submicron Thin-Film SOI MOSFET
Numerical Analysis of Bidirectional Negative Resistance Device
Numerical Simulation for Coupled-Cavity Slow-Wave Structure by Using MAFIA Code
The Numerical Analysis of Multi Pulse Discharge Characteristies in AC PDP by One Dimensional Fluid Discharge Model

Related Author

Luo Jinsheng
Liang Sujun
黄敞
石涌泉
Zhang Xing
王美田
盖学敏
王化雨

Related Institution

Dept,of Electronic Engineering,Xi’an Jiaotong University
  西安交通大学电子工程系 西安 710049  
Institute of Microelectronics,Peking University,Beijing 100871)Shi Yongquan
Huang Chang
北京大学微电子学研究所陕西微电子学研究所
0