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Electron-Sheet-Density Model in Strain-Si Modulation-Doped NMOSFET
更新时间:2025-07-16
    • Electron-Sheet-Density Model in Strain-Si Modulation-Doped NMOSFET

    • Acta Electronica Sinica   Vol. 33, Issue 11, Pages: 2056-2058(2005)
    • CLC: TN432
    • Published:2005

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  • HU Hui-yong, ZHANG He-ming, DAI Xian-ying, et al. Electron-Sheet-Density Model in Strain-Si Modulation-Doped NMOSFET[J]. Acta Electronica Sinica, 2005, 33(11): 2056-2058. DOI:

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Related Author

CHEN Jun-ning
KE Dao-ming
GAO Shan
DAI Yue-hua
WU Jian-min
JIANG Yao-lin
LI Zun-chao
ZHU Xiao-jun

Related Institution

Electronic Science and Technology Department,Anhui University
School of Electronics and Information Engineering, Xi'an Jiaotong University
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  东南大学微电子中心 南京 210018  
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