A Two Dimensional Dynamic Cellular Automata Model for Simulation of Photoresist Etching Process

ZHOU Zai-fa; HUANG Qing-an; LI Wei-hua; LU Wei

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A Two Dimensional Dynamic Cellular Automata Model for Simulation of Photoresist Etching Process

更新时间：2025-07-16

- A Two Dimensional Dynamic Cellular Automata Model for Simulation of Photoresist Etching Process
- Acta Electronica Sinica Vol. 34, Issue 5, Pages: 906-910(2006)
- 作者机构：
  
  东南大学MEMS教育部重点实验室,江苏,南京,210096
- 作者简介：
- 基金信息：
- DOI：
  CLC： TN386
- Published：2006
- 稿件说明：
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ZHOU Zai-fa, HUANG Qing-an, LI Wei-hua, et al. A Two Dimensional Dynamic Cellular Automata Model for Simulation of Photoresist Etching Process[J]. Acta Electronica Sinica, 2006, 34(5): 906-910.
DOI：

ZHOU Zai-fa, HUANG Qing-an, LI Wei-hua, et al. A Two Dimensional Dynamic Cellular Automata Model for Simulation of Photoresist Etching Process[J]. Acta Electronica Sinica, 2006, 34(5): 906-910. DOI：

摘要

针对光刻工艺模拟

首次建立了光刻胶刻蚀过程模拟的2-D动态元胞自动机(CA)模型

通过制定规则来确定模拟过程中不断更新的表面元胞

使得模拟只需要计算表面元胞的刻蚀过程.模型既有稳定性好的优点

又有运算速度快的优点.采用一些公认的光刻速率分布测试函数非常有效地模拟了光刻过程

模型在刻蚀速率变化非常大的区域也非常稳定.

Abstract

A two dimensional dynamic cellular automata (CA) model is presented for simulation of photoresist etching process for the first time.In the dynamic model

only etching front cells are processed in relevant etching steps

so the dynamic model is stable and fast.The model has been successfully tested using some well-known etch-rate distribution test functions.

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