On-Line Extraction for Thermal Diffusivity of Surface-Micromachined Polysilicon Thin Films

QI Li-na; HUANG Qing-an; LI Wei-hua

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On-Line Extraction for Thermal Diffusivity of Surface-Micromachined Polysilicon Thin Films

更新时间：2025-07-16

- On-Line Extraction for Thermal Diffusivity of Surface-Micromachined Polysilicon Thin Films
- Acta Electronica Sinica Vol. 34, Issue 8, Pages: 1549-1552(2006)
- 作者机构：
  
  东南大学MEMS教育部重点实验室,江苏,南京,210096
- 作者简介：
- 基金信息：
- DOI：
  CLC： TN304.055
- Published：2006
- 稿件说明：
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QI Li-na, HUANG Qing-an, LI Wei-hua. On-Line Extraction for Thermal Diffusivity of Surface-Micromachined Polysilicon Thin Films[J]. Acta Electronica Sinica, 2006, 34(8): 1549-1552.
DOI：

QI Li-na, HUANG Qing-an, LI Wei-hua. On-Line Extraction for Thermal Diffusivity of Surface-Micromachined Polysilicon Thin Films[J]. Acta Electronica Sinica, 2006, 34(8): 1549-1552. DOI：

摘要

本文提出了一种表面加工多晶硅薄膜的在线测试结构.模型综合考虑了辐射、对流以及向衬底的传热等因素的影响

通过分析两个长度不同但宽度与厚度相同的梁在相同加热电流下的瞬态电阻变化特性

来提取多晶硅薄膜的热扩散系数.用ANSYS软件验证了该模型的正确性

通过实验测得表面加工多晶硅薄膜的热扩散率为1.059×10

-5

±3×10

-6

/s.

Abstract

A test structure to measure the diffusivity of polysilicon thin films is proposed.The radiant heat loss and the convective heat loss from the structure have been considered.The same heating constant current is applied in the two beams

with the same width and thickness but variant length.The change of resistance with time up to thermal steady state is measured using a separation circuit

and then thermal diffusivity can be obtained.The model has been verified by ANSYS.The experiments show a thermal diffusivity of 1.059×10

-5

±3×10

-6m

/s.

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