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Threshold Voltage Model of a Novel Dual Polysilicon Material Gate LDMOS Based on Two Dimensional Potential Distribution
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    • Threshold Voltage Model of a Novel Dual Polysilicon Material Gate LDMOS Based on Two Dimensional Potential Distribution

    • Acta Electronica Sinica   Vol. 35, Issue 5, Pages: 844-848(2007)
    • CLC: TN386.1
    • Published:2007

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  • DAI Yue-hua, GAO Shan, KE Dao-ming, et al. Threshold Voltage Model of a Novel Dual Polysilicon Material Gate LDMOS Based on Two Dimensional Potential Distribution[J]. Acta Electronica Sinica, 2007, 35(5): 844-848. DOI:

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Related Author

WU Jian-min
JIANG Yao-lin
LI Zun-chao
WANG Shun-xiang
HU Hui-yong
ZHANG He-ming
DAI Xian-ying
ZHU Yong-gang

Related Institution

School of Electronics and Information Engineering, Xi'an Jiaotong University
Key Lab of Ministry of Education for Wide Bade-Gap Semiconductor Materials and Devices,School of Microelectronics,Xidian University
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  东南大学微电子中心 南京 210018  
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