DAI Yue-hua, GAO Shan, KE Dao-ming, et al. Threshold Voltage Model of a Novel Dual Polysilicon Material Gate LDMOS Based on Two Dimensional Potential Distribution[J]. Acta Electronica Sinica, 2007, 35(5): 844-848.
DOI:
DAI Yue-hua, GAO Shan, KE Dao-ming, et al. Threshold Voltage Model of a Novel Dual Polysilicon Material Gate LDMOS Based on Two Dimensional Potential Distribution[J]. Acta Electronica Sinica, 2007, 35(5): 844-848.DOI:
Threshold Voltage Model of a Novel Dual Polysilicon Material Gate LDMOS Based on Two Dimensional Potential Distribution
A novel lateral double-diffused metal oxide semiconductor field effect transistor (LDMOSFET) structure
using an effective concept of dual Polysilicon material gate
is proposed.The conventional polysilicon gate applied in LDMOSFET is divided into S-gate and D-gate by gate engineering.The special gate structure can improve driveability
suppress SCEs(short channel effects) and screen DIBL(drain-induced barrier lowering).The threshold voltage model is solved by two dimensional (2D) Poisson’s equation.The difference of workfunction and doping concentration distribution are also taken into account in the surface potential function.The results predicted by the model are compared with those obtained by 2D simulating to verify the accuracy of the proposed analytical model.