ZENG Shan, YU Wen-jian, ZHANG Meng-sheng, et al. Efficient Extraction of the Frequency-Dependent K Element and Resistance of VLSI Interconnects[J]. Acta Electronica Sinica, 2007, 35(11): 2072-2077.
DOI:
ZENG Shan, YU Wen-jian, ZHANG Meng-sheng, et al. Efficient Extraction of the Frequency-Dependent K Element and Resistance of VLSI Interconnects[J]. Acta Electronica Sinica, 2007, 35(11): 2072-2077.DOI:
Efficient Extraction of the Frequency-Dependent K Element and Resistance of VLSI Interconnects
In the integrated circuits with frequency above several GHz
parasitic inductive effect has extremely influenced the circuit performance.Therefore
efficient algorithms are required to extract the frequency-dependent parameters which capture the inductive effect.The recently proposed K element (inverse of the partial inductance) has a good localization property
and has been widely accepted for the modeling of parasitic inductance.However
most previous works on reluctance extraction did not take high frequency effect into account and were not efficient enough for 3-D complex structure In this paper
a set of algorithms are proposed to extract the frequency-dependent K element and resistance of 3D interconnects.With a windowing technique
a direct K extraction algorithm
and improvements on solving equations within the window
the proposed method is able to handle complex interconnect structures very efficiently.Compared with FastHenry
the presented method has a speedup ratio from several tens to several hundreds