Design for Manufacturability of Sub-100 Nanometer Standard Cells

ZHANG Pei-yong; YAN Xiao-lang; SHI Zheng; GAO Gen-sheng; MA Yue; CHEN Ye

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Design for Manufacturability of Sub-100 Nanometer Standard Cells

更新时间：2025-07-16

- Design for Manufacturability of Sub-100 Nanometer Standard Cells
- Acta Electronica Sinica Vol. 33, Issue 2, Pages: 304-307(2005)
- 作者机构：
  
  浙江大学超大规模集成电路设计研究所,浙江,杭州,310027
- 作者简介：
- 基金信息：
- DOI：
  CLC： TN402
- Published：2005
- 稿件说明：
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ZHANG Pei-yong, YAN Xiao-lang, SHI Zheng, et al. Design for Manufacturability of Sub-100 Nanometer Standard Cells[J]. Acta Electronica Sinica, 2005, 33(2): 304-307.
DOI：

ZHANG Pei-yong, YAN Xiao-lang, SHI Zheng, et al. Design for Manufacturability of Sub-100 Nanometer Standard Cells[J]. Acta Electronica Sinica, 2005, 33(2): 304-307. DOI：

摘要

本文介绍了亚100纳米工艺可制造性验证的一组工艺仿真和错误定位技术

制定了标准单元可制造性设计(DFM

Design For Manufacturability)的流程

重点讨论了在亚100纳米工艺条件下标准单元设计中遇到的一些典型可制造性问题

提出了相应的新设计规则和解决方案.依靠以上DFM技术方法

完成了实际90nm工艺标准单元可制造性设计工作.

Abstract

A group of technologies for sub-100nm process modeling and DFM (Design For Manufacturability) problem are presented.A DFM flow for standard cell design is implemented

with typical DFM patterns being discussed in detail.New design rules and solution styles are introduced as well.Based on the DFM flow and design styles

a set of DFM-friendly 90nm standard cells are designed.

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