

浏览全部资源
扫码关注微信
1. 上海交通大学
2. 西安电子科技大学
3. 上海交通大学西安电子科技大学
Published:1999
移动端阅览
[1]汤玉生,郝跃.MOS沟道和衬底电流的二维分布理论建模[J].电子学报,1999(07):73-76.
Tang YushengHao Yue. Theoretical Modeling of TwoDimensional Distributionsof Drain and Substrate Currents in MOSFET’S[J]. Acta Electronica Sinica, 1999, (7).
小尺寸MOS器件参量具有很强的分布效应,需要二维模型描述.本文从y截面流函数方程求解获得了MOS器件中的沟道电流和衬底电流二维分布解析模型.模型是横向场Ey(y)和纵向场Ex(y)的函数.二维分布模型载有较充分的物理过程,可以基本反映电流密度的实际分布.模型可应用于与电流路径相关的MOS器件特性的研究;特别重要的应用领域是MOS热载流子可靠性电子学中的栅电流分布建模.选用深亚微米MOS器件的横向场Ey(y)和纵向场Ex(y)及IDS模型,所建分布模型可应用于该尺寸区器件的沟道电流和衬底电流二维分布的描述.
There are strong distribution effects in very small MOSFET’s.Their some characteristics should be described by twodimensional models.In this paper
twodimensional analytic distribution models of drain and substrate currents are built by use of flow function equations on y crosssection.The models are dependent on vertical electrical field Ex(y) and horizontal electrical field Ey(y)
and include much more physical processes
and show basically the exact distributions of the current densities.These two analytic models can be used in studying the characteristics dependent on current lines
especially
in the field of gate current distribution modeling in MOS’s hotcarrier reliability electronics.Using models of Ex(y)
Ey(y)
IDS and so on in deep submicron MOSFET’s
the distribution models in the paper can be applied in these devices.
0
Views
90
下载量
2
CSCD
Publicity Resources
Related Articles
Related Author
Related Institution
京公网安备11010802024621