Calibration of IC Process Simulator SSUPREM4

Zhu Zhaomin; Ruan Gang

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Calibration of IC Process Simulator SSUPREM4

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- Calibration of IC Process Simulator SSUPREM4
- Acta Electronica Sinica Issue 8, (1999)
- 作者机构：
  
  1. 复旦大学电子工程系
  2. 上海先进半导体制造有限公司
  3. 复旦大学电子工程系上海先进半导体制造有限公司
- 作者简介：
- 基金信息：
- DOI：
  CLC： TN405
- Published：1999
- 稿件说明：
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[1]阮刚,庞海舟,冒慧敏.集成电路工艺模拟软件SSUPREM4的校验[J].电子学报,1999(08):27-30.

Zhu Zhaomin, Ruan Gang. Calibration of IC Process Simulator SSUPREM4[J]. Acta Electronica Sinica, 1999, (8).
[1]阮刚,庞海舟,冒慧敏.集成电路工艺模拟软件SSUPREM4的校验[J].电子学报,1999(08):27-30. DOI：

Zhu Zhaomin, Ruan Gang. Calibration of IC Process Simulator SSUPREM4[J]. Acta Electronica Sinica, 1999, (8). DOI：

摘要

本文对知名的集成电路工艺模拟软件ＳＳＵＰＲＥＭ４进行了较仔细的校验，用ＳＳＵＰＲＥＭ４模拟了氧化、扩散工艺，并同实验值进行了比较，模拟值和实验值的偏差在１０％以内，与集成电路器件模拟软件ＳＰＩＳＣＥＳ联用校验了ＳＳＵＰＲＥＭ４的全工序模拟结果，校验结果有较大参考价值．

Abstract

Careful calibration of IC process simulator SSUPREM4 is made in this paper.We simulate oxidation and diffusion by SSUPREM4.The simulated values are compared with the measured values

and the relative deviation between them is within 10%.We also calibrate the simulated results of full process by SSUPREM4 together with device simulator S PISCES.The calibrated results have some values for references.

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