A New Model for Alignment Signal Analyze of Phase GratingAlignment System in the Projection Lithography

Chen Minqi

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A New Model for Alignment Signal Analyze of Phase GratingAlignment System in the Projection Lithography

更新时间：2025-12-08

- A New Model for Alignment Signal Analyze of Phase GratingAlignment System in the Projection Lithography
- Acta Electronica Sinica Issue 7, (1999)
- 作者机构：
  
  中国科学院上海冶金所微电子分部
- 作者简介：
- 基金信息：
- DOI：
  CLC： O438
- Published：1999
- 稿件说明：
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[1]陈敏麒.投影光刻中相位光栅对准信号计算的新模型[J].电子学报,1999(07):83-86.

Chen Minqi. A New Model for Alignment Signal Analyze of Phase GratingAlignment System in the Projection Lithography[J]. Acta Electronica Sinica, 1999, (7).
[1]陈敏麒.投影光刻中相位光栅对准信号计算的新模型[J].电子学报,1999(07):83-86. DOI：

Chen Minqi. A New Model for Alignment Signal Analyze of Phase GratingAlignment System in the Projection Lithography[J]. Acta Electronica Sinica, 1999, (7). DOI：

摘要

对分步重复投影半导体光刻机相位光栅对准信号作了详细的分析，提出了更加合理精确的计算模型，并与其他论文中的实验数据作了初步比较，模型与实验更加接近．本文所提供的方法也适用于对有减反膜的光刻工艺对准信号的分析．

Abstract

A detail analysis about the alignment signal of wafer phase grating in the projection lithography processes has been investigated.Based on Fourier optics and matrix optics the model discussed here considers that the reflectivity is various over the wafer phase grating with processes layers and resist layer.The alignment structure of resist grating over bare wafer is also described with similar considerations.The calculated results are compared with the experiment data published by others

they are closer each other.The computer program here is also suitable for the analysis of the alignment signal in the lithography with chemical mechanical polish or with antireflective coating.

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