Thermistors have been fabricated from B-doped polycrystalline films by microwave plasma CVD method. The device structure consisted of 2μm thick of boron doped diamond films on a Si3N4 substrate.Ohmic contacts were established with an annealed titanium/gold bilayer structure. As a result
the thermistors with good ohmic contact
liner temperature response and high TCR (temperature coefficient of resistance) from room temperature to 600℃ have been obtained.