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西安交通大学电子工程系微电子学研究所
Published:1996
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[1]张万荣,曾峥,罗晋生.Si/SiGe/Si双异质结晶体管异质结势垒效应(HBE)研究[J].电子学报,1996(11):43-47.
张万荣, 曾峥, 罗晋生. Heterojunction Barrier Effects in Si/SiGe/Si Double Heteroiunction Bipolar Transistor[J]. Acta Electronica Sinica, 1996, (11).
本文研究了不同温度下Si/SiGe/Si双异质结晶体管(DHBT)异质结势垒效应(HBE),研究发现,集电结(BC)处价带能量差△Ev越大,HBE越明显,在给定的△Ev下,随着温度的降低,HBE越显著。在低温下HBE比常温下更严重地退化器件参数;基于以上研究结果,我们指出了减弱HBE的有效方法,本研究结果对设计开发Si/SiGe/SiHBT,尤其对设计开发低温工作的微波功率Si/SiGe/SiHBT是非常重要的。
The heterojunction barrier effects(HBE) in Si/SiGe/Si double heterojunction bipolar transistors (DHBTs) at various temperatures are studied.It is found that HBE becomes more evident with the increase of the valence-band discontinuity △Ev at the BC heterojunction.For a given △Ev at the BC heterojunction
as the temperature is reduced
HBE becomes more remarkable and seriously degrades HBT performance parameters.Based on above results
the effective measures to alleviate the HBE are proposed.These results will be very important for the design and development of low-temperature-operation microwave power SiGe HBT.
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