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1. 清华大学微电子所
2. 香港科技大学电机电子工程系
3. 清华大学微电子所香港科技大学电机电子工程系
Published:1995
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[1]王煜,张鹏飞,侯东彦,钱佩信,罗台秦.SOI MOSFETI-V特性的计算机模拟[J].电子学报,1995(02):30-34.
王煜, 张鹏飞, 侯东彦, et al. Computer Simulation of I-V Characteristics of SOI MOSFET[J]. Acta Electronica Sinica, 1995, (2).
[1]王煜,张鹏飞,侯东彦,钱佩信,罗台秦.SOI MOSFETI-V特性的计算机模拟[J].电子学报,1995(02):30-34. DOI:
王煜, 张鹏飞, 侯东彦, et al. Computer Simulation of I-V Characteristics of SOI MOSFET[J]. Acta Electronica Sinica, 1995, (2). DOI:
本文研究了SOIMOSFET的I-V特性,建立了一套模拟SOI器件工作特性的解析模型,适用于不同的SOI膜厚和各种前、背栅的偏置情况,在各种不同情况下由计算机自动选择适当模型进行拟合,该模型物理意义明确,计算简便快速,所用参数易于提取。
The I-V characteristics of SOI MOSFET are studied and an analytic model for SOI MOS devices is established.The model
which is valid for any SOI film thickness and each kind of front/back-gate bias conditions
has such advantages as analytic expression
clear physical meaning
simple and quick calculation
and easy extraction of used parameters.For each SOI film thickness or back gate bias
the suitable expression will be adopted automatically by the computer.The simulation results are well consistent with the experimental data.
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