肖志雄, 郑茳, 魏同立, et al. Analysis of the Low Temperature Characteristics of Physical Parameters in the Heavily Doped Silicon[J]. Acta Electronica Sinica, 1995, (8).
肖志雄, 郑茳, 魏同立, et al. Analysis of the Low Temperature Characteristics of Physical Parameters in the Heavily Doped Silicon[J]. Acta Electronica Sinica, 1995, (8).DOI:
Analysis of the Low Temperature Characteristics of Physical Parameters in the Heavily Doped Silicon
Under the consideration of the bandgap narrowing effect which is resulted from the heavily doping
we propose a new mathematic temperature model for the ionized fraction and the effective majority-carrier concentration.By using this calculative model
the current gain determined by the emission efficiency in silicon bipolar transistors is derived.The obtained results are in agreement with the experimental data.This provides a beneficial basis for the design of low temperature silicon devices.