Quality Control ol High Purity Water, Gases and Chemicals for Mega-bit Integrated Circuits

Wen Ruimei

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Quality Control ol High Purity Water, Gases and Chemicals for Mega-bit Integrated Circuits

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- Quality Control ol High Purity Water, Gases and Chemicals for Mega-bit Integrated Circuits
- Acta Electronica Sinica Issue 5, Pages: 24-30(1993)
- 作者机构：
  
  中国科学院半导体研究所,北京,100083
- 作者简介：
- 基金信息：
- DOI：
  CLC：
- Published：1993
- 稿件说明：
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[1]闻瑞梅.兆位电路用高纯水、气和化学试剂的质量控制[J].电子学报,1993(05):24-30.

Wen Ruimei. Quality Control ol High Purity Water, Gases and Chemicals for Mega-bit Integrated Circuits[J]. Acta Electronica Sinica, 1993, (5): 24-30.
[1]闻瑞梅.兆位电路用高纯水、气和化学试剂的质量控制[J].电子学报,1993(05):24-30. DOI：

Wen Ruimei. Quality Control ol High Purity Water, Gases and Chemicals for Mega-bit Integrated Circuits[J]. Acta Electronica Sinica, 1993, (5): 24-30. DOI：

摘要

本文阐述了高纯水、高纯气和高纯化学试剂的质量对兆位电路的影响

研究了高纯水中颗粒、金属、非金属、细菌以及总有机炭对VLSI性能的影响

研究了半导体器件工艺中氯化氢、氨、氮及硅烷气体中氧、水、二氧化碳、总碳氢化物等杂质对VLSI工艺的影响;研究了化学试剂中杂质对VLSI工艺的影响。

Abstract

The effect of quality of high purity water

gases and chemicals on mega-bit integrated circuits has been investigated. The Influence of particles

metallic and nonmetallic impurities

bacteria and total organic carbon in high purity water on performance of VLSI has been studied. The influence of impurity oxygen

water

carbon dioxide

total hydrocarbon （THC） in hydrogen chloride

nitrogen ammonia and silane on VLSI processing

and the effect of impurities in chemicals on VLSI processing have been studied.

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Related Author

Wen Ruimei

岩堀博

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高岷

Related Institution

Institute of Semiconductors,Chinese Academy of Sciences,Beijing 100083)H.Iwahori,T.Katsura

日东电工滋贺工厂

日东电工北京办事处

中国科学院半导体研究所日东电工滋贺工厂日东电工北京办事处

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