Calculations of Aberrations for Combined Electrostatic Focusing-Deflection Systems with Curvilinear Optical Axes

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- Calculations of Aberrations for Combined Electrostatic Focusing-Deflection Systems with Curvilinear Optical Axes
- Acta Electronica Sinica Issue 6, Pages: 36-42(1992)
- 作者机构：
  
  1. 北京大学无线电电子学系
  2. 北京大学无线电电子学系北京 100871
- 作者简介：
- 基金信息：
- DOI：
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- Published：1992
- 稿件说明：
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[1]刘志雄,西门纪业.弯曲轴静电聚焦—偏转复合系统的象差计算[J].电子学报,1992(06):36-42.

Liu Zhixiong, Ximen Jiye. Calculations of Aberrations for Combined Electrostatic Focusing-Deflection Systems with Curvilinear Optical Axes[J]. Acta Electronica Sinica, 1992, (6): 36-42.
[1]刘志雄,西门纪业.弯曲轴静电聚焦—偏转复合系统的象差计算[J].电子学报,1992(06):36-42. DOI：

Liu Zhixiong, Ximen Jiye. Calculations of Aberrations for Combined Electrostatic Focusing-Deflection Systems with Curvilinear Optical Axes[J]. Acta Electronica Sinica, 1992, (6): 36-42. DOI：

本文对透镜后偏转和透镜中偏转的两种静电聚焦一偏转复合系统的三级几何象差和一级色差进行了数值计算。计算结果表明

在匹配弯曲轴的情况下

这种复合系统有可能获得较小的偏转象差

同时本文也给出了判断复合系统中聚焦场与偏转场真正匹配的某些判据。

In this paper the third order geometric and first order chromatic aberrations for two types of combined electrostatic focusing-deflection systems

i. e. post-lens deflection system and in-lens deflection system

have numerically been calculated. The computational results show that in the case of matched curvilinear optical axes

it is possible to achieve smaller deflection aberrations in such combined systems. In the meantime

certain criteria for truly matching between focusing and deflection fields in combined systems have also been given.

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