Thermodynamic Study on CVD Tungsten Silicide System

Wang Yong-fa; Zhang Shi-li; Zhou Qing; Wang Ji-tao

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Thermodynamic Study on CVD Tungsten Silicide System

更新时间：2025-12-08

- Thermodynamic Study on CVD Tungsten Silicide System
- Acta Electronica Sinica Issue 3, Pages: 14-18(1989)
- 作者机构：
  
  复旦大学材料系
- 作者简介：
- 基金信息：
- DOI：
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- Published：1989
- 稿件说明：
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[1]王永发,张世理,周庆,王季陶.化学气相淀积硅化钨体系热力学研究[J].电子学报,1989(03):14-18.

Wang Yong-fa, Zhang Shi-li, Zhou Qing, et al. Thermodynamic Study on CVD Tungsten Silicide System[J]. Acta Electronica Sinica, 1989, (3): 14-18.
[1]王永发,张世理,周庆,王季陶.化学气相淀积硅化钨体系热力学研究[J].电子学报,1989(03):14-18. DOI：

Wang Yong-fa, Zhang Shi-li, Zhou Qing, et al. Thermodynamic Study on CVD Tungsten Silicide System[J]. Acta Electronica Sinica, 1989, (3): 14-18. DOI：

摘要

本文给出了以WF

或WCl

为钨源

以硅烷或氯硅烷为硅源的硅化钨气相淀积体系的热力学研究结果。结合实验

讨论了热力学结果对实验的指导和局限。

Abstract

This paper presents the result of thermodynamic study on Chemical Vapor Deposition （CVD） tungsten silicide system using WF6 or WCl6 as tungsten source and silane or chloride as silicon source. The direction for experimental research and the limitation of the thermodynamic result are discussed by combining with experimental results.

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