Spotting IC Photomask Defects by Using White Light Spatial Filter Processor

Cen Zhao-chang; Zhao Duan-cheng; Zhang Kun-ming

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Spotting IC Photomask Defects by Using White Light Spatial Filter Processor

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- Spotting IC Photomask Defects by Using White Light Spatial Filter Processor
- Acta Electronica Sinica Issue 5, Pages: 75-79(1986)
- 作者机构：
  
  1. 华南师范大学
  2. 广州大学
- 作者简介：
- 基金信息：
- DOI：
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- Published：1986
- 稿件说明：
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[1]岑钊常,赵端程,张坤明,李绍泉,李介眉.用白光空间滤波系统检查IC掩模缺陷[J].电子学报,1986,{4}(05):75-79.

Cen Zhao-chang, Zhao Duan-cheng, Zhang Kun-ming. Spotting IC Photomask Defects by Using White Light Spatial Filter Processor[J]. Acta Electronica Sinica, 1986, (5): 75-79.
[1]岑钊常,赵端程,张坤明,李绍泉,李介眉.用白光空间滤波系统检查IC掩模缺陷[J].电子学报,1986,{4}(05):75-79. DOI：

Cen Zhao-chang, Zhao Duan-cheng, Zhang Kun-ming. Spotting IC Photomask Defects by Using White Light Spatial Filter Processor[J]. Acta Electronica Sinica, 1986, (5): 75-79. DOI：

摘要

本文介绍一种使用空间滤波的实时单一镜头白光信息处理系统来检查IC光刻掩模缺陷的方法。采用这种方法比传统的镜检法或激光相干处理技术更为简单、快速

且效果明显。它能明显地检查出IC掩模里的黑点、针孔、刻痕、电路缺损、短路和断路等微小缺陷

并可检测出最小线度为2μm的缺陷。

Abstract

A real-time one-lens white light information processing system is described in which spatial filtering is used to spot defects on IC photomasks. Check-up with this system is simpler

faster and more convenient than the traditional microscopy or laser coherent optical processing technique. With the aid of this system

such defects as black spots

pinholes

scratches

loss of circuits

short-circuits or disconnections

etc

can easily be located

and defects as small as a minimum of 2μm linearity can also be detected.

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