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中国科学院上海冶金所
Published:1985
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[1]章熙康,王缨,白国仁,江绵恒,王其闵.氧对a-Si:H光诱导效应的影响[J].电子学报,1985(02):117-120.
Zhang Xi-kang, Wang Ying, Bei Guo-ren, et al. Influence of Oxygen on the Photo-induced Effect in a-Si:H[J]. Acta Electronica Sinica, 1985, (2): 117-120.
研究了氧掺杂对a-Si:H光诱导Staebler-Wronski效应的影响(随着掺氧量的增加
光诱导效应减弱)。在掺氧的a-si:H中
红外吸收光谱显示出氧原子主要作为氢原子附近的弱Si-Si键的桥键原子。吸收系数和光子能量的关系表明有Urbach吸收边存在
且微量氧将使a-Si:H网络的无序度降低。同时
光照大大促进桥键氧原子的耦合
弱Si-Si键被打断。因此
掺氧的a-Si:H膜的Staebler-Wronski效应减弱是由于微量氧原子稳定了弱Si-Si键的缘故。
The photo-induced conductance change decreases with the increase in oxygen content in the a-Si:H films. The IR absorption spectra show that in oxygen-doped a-Si:H Films
oxygen atoms serve as bridging atoms in the Si-Si weak bonds. The analysis of absorption data indicates that a small amount of oxygen can reduce the disorder of a-Si:H networks. In addition
illumination promotes the coupling of bridging oxygen atoms
suggesting that the Si-Si weak bonds are broken by photons during illumination. From the experimental results it is concluded that oxygen atoms stabilize the weak bonds and thus reduce the photo-induced conductance change.
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