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中国科学院上海冶金所
Published:1983
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[1]邹世昌,王渭源,林成鲁,夏冠群.用连续CO_2激光合金化制备Au-Ge-Ni-n GaAs欧姆接触[J].电子学报,1983(01):104-106.
Zou Shi-chang, Wang Wei-yuan, Lin Cheng-lu, et al. CW CO2 Laser Alloying of Au-Ge-Ni Ohmic Contacts on n-GaAs[J]. Acta Electronica Sinica, 1983, (1): 104-106.
本文利用CW CO
2
激光对GaAs的穿透性从GaAs晶片背面进行辐照
形成了良好的Au-Ge-Ni-n GaAs欧姆接触。研究了激光合金化对不同摻杂浓度GaAs的欧姆接触
并与热合金化作了对比试验。结果表明
激光合金化有较低的比接触电阻
材料的载流子浓度越低
比接触电阻降低得越显著。AES分析表明
激光合金化造成了一个优良的以Ge取代Ga的重掺杂的n型GaAs层。
Backside irradiation through the substrate with a CW CO2 laser has been used to produce Au-Ge-Ni ohmic contacts on n-GaAs with different doping concentrations(6×10(14)-7×10(17)cm-3).The laser alloyed contacts show better ohmic behavior and a contact resistance lower than that of furnace alloyed contacts by approximately an order of magnitude for low bulk concentrations(5×10(18)cm-3).The formation of a Ge-enri-ched n-type GaAs layer after laser alloying
as shown by the results of AES analysis
is helpful to improve the interface properties of the contacts.
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