The Epitaxial Growth of Sub-Micro Silicon Film by Hydrogen Reduction of SiCI4

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- The Epitaxial Growth of Sub-Micro Silicon Film by Hydrogen Reduction of SiCI4
- Acta Electronica Sinica Issue 1, Pages: 85-87(1980)
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- Published：1980
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[1]蔡田海,,,,,,,,,韩文蔷,,,,,,,,,傅琍琍.四氯化硅氢还原法亚微米薄层硅外延生长[J].电子学报,1980(01):85-87.

Cai Tian-hai Han Wen-qiang Fu Li-li. The Epitaxial Growth of Sub-Micro Silicon Film by Hydrogen Reduction of SiCI4[J]. Acta Electronica Sinica, 1980, (1): 85-87.
[1]蔡田海,,,,,,,,,韩文蔷,,,,,,,,,傅琍琍.四氯化硅氢还原法亚微米薄层硅外延生长[J].电子学报,1980(01):85-87. DOI：

Cai Tian-hai Han Wen-qiang Fu Li-li. The Epitaxial Growth of Sub-Micro Silicon Film by Hydrogen Reduction of SiCI4[J]. Acta Electronica Sinica, 1980, (1): 85-87. DOI：

本文叙述了供4 mm雪崩二极管用的亚微米硅外延膜的制备过程。文中给出了若干结果。

A fabrication process of sub-micro silicon film used for 4mm IMPATT diode was described and some experimental results were given.

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