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Published:1964
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[1]西门纪业,,,,,,,,,,,陈千寿.极端头椭圆畸变的磁透鏡場分布和象差的理論研究[J].电子学报,1964(04):72-84.
SIMON CHI-YEH AND CHENG CHEN-SO. ANALYTICAL SOLUTION OF THE POTENTIAL DISTRIBUTION AND ELECTRON OPTICS IN MAGNETIC LENS WITH POLE-PIECES OF ELLIPTIC DISTORTION[J]. Acta Electronica Sinica, 1964, (4): 72-84.
高分辨本領电子光学仪器(例如电子显微镜)要求电子透镜具有理想的旋轉对称性。但是实际的电子透镜存在着非旋轉对称的缺陷;其中极端头的椭圓畸变影响最为严重。 本文研究了磁透镜場分布的椭圓畸变及其象差。首先利用数理方法(分离变数法)和馬休(Mathieu)函数的性貭求出了椭圓畸变场在圓柱坐标系中的严格解析結果。它們便于进行实际計算。当椭圓度为微扰的情况下得出了場的表示式和数值結果。由此求出极端头椭圓畸变引起的軸上象散
給出了加工容差。 本文所用方法与所得結果均适用于研究靜电透鏡。
Errors in the machining of the objective lens in an electron microscope may result in aberrations which prevent the realization of the theoretically possible resolving power of the instrument. This paper treats the electron-optics problem of relating the aberrations to their causative machining defects-elliptic distortion of pole-pieces.The analytical method of mathematical physics is used for obtaining the scalar potential field in a magnetic lens with pole-pieces of elliptic distortion (Fig. 1). The scalar potential expansion in elliptic-cylindrical co-ordinates is given (from 2.16)
which are exact analytical formulas in term of the coefficients of Mathieu function and convenient to calculate. If the ellipticity of pole-pieces is small when compared with unity
the previous potential expansions in the neighbourhood of the axis are reduced to simpler formulas (from 2.24
2.26) which apparently relate the potential perturbation to the perturbation of pole-pieces.By drawing on the previous resultants
the paraxial electron trajectories of the lens are calculated (Fig. 5). Then according to W. Glaser
the aberration coefficients α1
α2 (from 3.9
3.11) are obtained.In conclusion
the tolerances for ellipticity are given. For Example: if δ = 2 A
the variation in radius must not exceed 0.15
μ (k2 = 1) or 0.30 μ (k2 = 2)
these tolerances are very difficult to attain.
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