THEORETICAL STUDY OF FIELD DISTRIBUTION AND ABERRATIONS IN A MAGNETIC LENS WITH POLE PIECES OF INCLINED END-FACES

SI-MEN GI-IE AND XI ZHUNG-XO

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THEORETICAL STUDY OF FIELD DISTRIBUTION AND ABERRATIONS IN A MAGNETIC LENS WITH POLE PIECES OF INCLINED END-FACES

更新时间：2025-12-08

- THEORETICAL STUDY OF FIELD DISTRIBUTION AND ABERRATIONS IN A MAGNETIC LENS WITH POLE PIECES OF INCLINED END-FACES
- Acta Electronica Sinica Issue 3, Pages: 24-35(1964)
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- Published：1964
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[1]西门纪业,,,,,,,,,,,奚中和.极端头端面倾斜的磁透镜场分布和象差的理论研究[J].电子学报,1964,{4}(03):24-35.

SI-MEN GI-IE AND XI ZHUNG-XO. THEORETICAL STUDY OF FIELD DISTRIBUTION AND ABERRATIONS IN A MAGNETIC LENS WITH POLE PIECES OF INCLINED END-FACES[J]. Acta Electronica Sinica, 1964, (3): 24-35.
[1]西门纪业,,,,,,,,,,,奚中和.极端头端面倾斜的磁透镜场分布和象差的理论研究[J].电子学报,1964,{4}(03):24-35. DOI：

SI-MEN GI-IE AND XI ZHUNG-XO. THEORETICAL STUDY OF FIELD DISTRIBUTION AND ABERRATIONS IN A MAGNETIC LENS WITH POLE PIECES OF INCLINED END-FACES[J]. Acta Electronica Sinica, 1964, (3): 24-35. DOI：

摘要

高分辨本领电子光学仪器（例如电子显微镜）要求电子透镜具有严格的旋转对称性

但是实际的电子透镜存在着非旋转对称的缺陷

从而影响了仪器的质量。在这些缺陷中

极端头的端面倾斜目前还没有研究过。本文计算和讨论了磁透镜极端头端面倾斜所引起的电子光学象差

作者应用数理方法（分离变数法）得到了端面倾斜情况下场分布的严格解析表达式;当倾斜为微扰时计算了非旋转对称象差以及它们与几何参量的关系;得出了高斯象平面上轴上象散圆斑大小;最后讨论了高斯轨迹的微扰及其象差图形。结果表明:轴上象散椭圆斑和端面倾斜角度正切的平方成正比

由此给出了极端头端面倾斜的加工容差。本文所用方法与所得结果均适用于研究静电透镜。

Abstract

Electron-optical instruments （e.g. the electron microscope） with high resolving power require strict rotational symmetry in its electron lens system. But in a real system there exist defects in this symmetry

among which the effects due to pole pieces of inclined end faces remain to be studied.This paper investigates the electron optical aberration due to such defect. Method of separation of variables is employed to obtain an exact analytical formula of the scalar potential field. Paraxial electron trajectories of the lens are calculated. Aberration characteristics is analyzed in detail. As a conclusion

the tolerance for inclination of the end faces of the pole pieces is given

which lies well within limits of normal workshop practice.Methods of study and the results thereby obtained are also applicable to an electrostatic lens system.

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