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1. 全光网络与现代通信网教育部重点实验室,北京,100044
2. 北京交通大学光波技术研究所,北京,100044
3. 中国运载火箭技术研究院,北京,100076
Published Online:25 August 2018,
Published:2018
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HOU Hai-jian, LI Da-wei, WANG Jun-hong. Study on the Time Domain Sputtering Effect and Scattering of Slot Arrays of Different Sizes[J]. Acta Electronica Sinica, 2018, 46(8): 2030-2034.
HOU Hai-jian, LI Da-wei, WANG Jun-hong. Study on the Time Domain Sputtering Effect and Scattering of Slot Arrays of Different Sizes[J]. Acta Electronica Sinica, 2018, 46(8): 2030-2034. DOI: 10.3969/j.issn.0372-2112.2018.08.032.
时域溅射,是散射体结构不同部分产生的散射回波在远场叠加时,其时域波形在开始部分出现的不稳定的现象.对于低散射目标,只有在回波叠加稳定后,其散射电场的幅度才变得很低,而在开始的几个电波周期内会有比较强的散射电场.本文对缝隙阵列的时域溅射特性进行研究,采用周期边界时域有限差分(Finite-Difference Time-Domain,FDTD)算法对不同尺寸的缝隙阵列的时域溅射特性进行了仿真,提取了其等效电路参数,并采用等效电路法分析了缝隙宽度引起的并联电容对正弦波时域溅射和高斯脉冲时域散射特性的影响.分析结果发现:当并联电容降低的时候,时域反射系数的包络值下降速度增加,导致溅射现象的最大值降低.理论结果得到了实验验证.
Time domain sputtering effect is the phenomenon that the time domain scattering waveform is large and unstable at the beginning when the scatterings from different parts of the scatterer are overlapped in the far field.For low RCS targets
the amplitudes of the total scattering decreases only after the scatterings from different parts are overlapped and stabilized.And there is a relatively strong total scattering in the beginning.In this paper
the time domain sputtering characteristics of slot arrays with different sizes are studied and simulated by finite-difference time domain algorithm.The equivalent circuit parameters are extracted by the equivalent circuit method.The effects of parallel capacitances caused by widths of the slots on sine wave time-domain sputtering and Gaussian pulse time-domain characteristics are analyzed by the equivalent circuit method.The results show that when the parallel capacitance decrease
the decrease rate of the envelope value of the time domain reflection coefficient increase
which leads to the decrease of the maximum value of the sputtering effect.The theoretical results have been verified by experiments.
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