An auto-alignment system of the chip marks for the electron beam lithography is described.The system consists of the scanning controller

the gathering image subsystem

the calculation unit of the correlative position of the marks

and the correction subsystem of the position and angle.Using this system

the accomplishment aligninent of two marks takes about 11 seconds

the minimum corrected angle is 0.014 degree

and the achieved registration overlay accuracy is 3σ≤0.07μm.