1. 厦门集美航海学院物理室
2. 厦门大学物理系
纸质出版:1995
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[1]朱文章,沈顗华,刘士毅.光伏法研究掺金硅特性[J].电子学报,1995(02):44-48.
Zhu Wenzhang. Study on Properties of Au-Doped Silicon by Photovoltaic Method[J]. Acta Electronica Sinica, 1995, (2).
本文采用光伏方法测量掺金硅的少子寿命,掺金浓度为10
12
~6.62×10
15
cm
-3
,4个数量级;根据对两类不同电阻率的N型掺金硅少子寿命系统的测量和统计计算,提出了对硅中金性质的看法。统计计算及简并因子和金施主与金受主的相关性,实验和计算结果都表明,高浓度金掺杂可以改变N型高阻硅的导电类型。
The minority carrier lifetime of Au-doped silicon has been measured by photovoltaic method.The Au-doped concentrations are between 10 ̄(12) ̄ 6.62×10 ̄(15)cm ̄(-3)
covering four orders of magnitude.On the basis of the systematic measurement and the statistical calculation of minority carier lifetime of two kinds of N-type Au-doped sihcon with different resistance
the views on the properties of Au in silicon are presented.The degeneracy factors and the interrelation between Au donor and acceptor are taken into account in statistical calculation. Both experimental and calculated results show that Au doping at high concentration can change N-type high-resistance silicon into P-type.
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