The structure and performance of the external pressurizing capillary ultrafiltration modules are described and compared with internal pressurizing capillary ultrafiltration modules. The colloidal silica
bacteria and endotoxin with diameter greater than 70 can be removed completely by the external pressurizing capillary UF modules
which can meet the requirement of VLSI
therefore
they are excellent to by used as a final step in the polishing system.