肖志雄, 郑茳, 魏同立, et al. Analysis of the Low Temperature Characteristics of Physical Parameters in the Heavily Doped Silicon[J]. Acta Electronica Sinica, 1995, (8).
肖志雄, 郑茳, 魏同立, et al. Analysis of the Low Temperature Characteristics of Physical Parameters in the Heavily Doped Silicon[J]. Acta Electronica Sinica, 1995, (8).DOI:
Under the consideration of the bandgap narrowing effect which is resulted from the heavily doping
we propose a new mathematic temperature model for the ionized fraction and the effective majority-carrier concentration.By using this calculative model
the current gain determined by the emission efficiency in silicon bipolar transistors is derived.The obtained results are in agreement with the experimental data.This provides a beneficial basis for the design of low temperature silicon devices.