运用直流磁控反应溅射技术,在不同的氧气压强下,沉积NiOx薄膜。随后在1MKOH电解溶液中处理成NiOxHy。测量了NiOxHy薄膜的电化学性质。在0.35-2.5μm波长范围内测定了NiOxHy薄膜漂白态与着色态的垂直透过率与近于垂直的反射率,导出了这两种状态的平均可见光透射率、反射率、吸收率与溅射氧压强关系。给出了近于最佳参数样品的吸收系数曲线,对电致变色机理作了讨论。
NiOx thin films were prepared using dc magnetron reactive sputtering in the various pressures of oxygen. They were subsequently hydrated to obtain NiOxHy by treatment in the aqueous KOH. Electrochemical characterization of NiOxHy thin films were measured
and spectral normal transmittance and near normal reflectance for bleached state and coloured state of NiOxHy thin films were measured in 0.35〈λ〈2.5μm wavelength range. Sputtering oxygen pressure dependence of average luminous transmittance
reflectance and absorptance on the bleached and coloured state was derived. The absorption coefficients for near optimum sample vs wavelength and electrochromatic mechanism were discussed.
0
浏览量
67
下载量
3
CSCD
关联资源
相关文章
相关作者
相关机构
京公网安备11010802024621