中国科学院半导体研究所
纸质出版:1994
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[1]周洁,王永康,孙景兰,卢励吾,吴汲安.氢对硅中4d过渡杂质的钝化[J].电子学报,1994(05):80-83.
周洁, 王永康, 孙景兰, et al. Hydrogen Passivation of Deep Level Related to 4d Transition Impurities in Silicon[J]. Acta Electronica Sinica, 1994, (5).
本文研究了氢原子与Si中4d过渡杂质(Pd、Rh、Ru、Mo)引入深中心的相互作用,得到了Si中这些深中心被钝化的难易程度.从钝化角度支持了Si:Pd与Si:Rh中有关能级属于同一中心、不同荷电态的判断,同时提出了Si:Mo中E(0.53)和H(0.16)两个能级属于同一中心、不同荷电态的证据,通过氢对已知同一中心、不同荷电态两个能级的相互作用,对氢的钝化机理作了初步探讨.
The interaction between hydrogen and centers in silicon introduced by 4d trasition impurities was investigated
and the order of sensitivity of these deep centers to hydrogen passivation was obtained. From the point of view of hydrogen passivation
we have got evidences to support the identical center suggestion for the levels related in p-Si: Pd and n-Si : Rh
and we suggest that E(0.53)and H(0. 36) in Si : Mo have this kind of property. The mechanism of hydrogen passivation is also discussed through the charge states of atomic hydrogen in silicon.
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