南开大学电子科学系
纸质出版:1991
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[1]熊绍珍,孟志国,王玉冰,王广才,孙云,王宗畔,孙钟林,徐温元.a-Si PIN太阳能电池中PI间缓冲层的作用[J].电子学报,1991(02):39-43.
Xiong Shaozhen, Meng Zhiguo, Wang Yubing, et al. The Effect of Buffer Layer between P and l Layers in a-Si PIN Solar Cells[J]. Acta Electronica Sinica, 1991, (2): 39-43.
本文测量了电池表观禁带宽度E
g
app
与缓冲层厚度的关系
研究表明
缓冲层能改善V
oc
的原因是加宽了电池的表观带隙
降低反向饱和电流。它还能增强PI界面电场强度
减小该区及Ⅰ层内的复合。但碳的引入又会降低电池稳定性
为此需要兼顾电池性能与稳定性而优化选择缓冲层的厚度。
The dependence of apparent band gap (EgaDD) on buffer layer thickness has been measured. The result shows that the EgaDD of the cell with a buffer layer is widened by introduction of the buffer layer
which contributes to decrease the reverse saturation current Io and improve the VocThe C graded buffer layer can not only increase the inner electric field and decrease the recombination current in I layer to a certain degree but also result in the fast degradation of the performance of cells. The thickness of buffer layer must properly be chosen in order to guarantee both the improvement of efficiency and the stability of the cells.
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