Proper regulation of technological parameters

Ts and r. f deposition power

can result in a mode transformation from amorphous morphology into microcrystalline or polysili-con-like structure.The crystallization of amorphous silicon film leads to a further reduction in its room-temperature resistivity by about three order of magnitude and a reduction in its activation energy of electrical conductivity. The enhancement of conducting performance is a consequence of the narrow band tail width in crystallized microcrystalline silicon.