在晶体管模型和电路分析中
Early电压的概念已被广泛应用。本文讨论了任意基区晶体管Early电压的物理关系
导出了恒流驱动条件下的Early电压V
A(I)
与恒压驱动条件下的Early电压V
A(V)
之间的表达式
考虑了发射结势垒复合对V
A(I)
和基区少子电荷对V
A(V)
的影响。结果表明
由于基区校正因子的存在和V
A(V)
随电流的变化
通过开路与短路输出阻抗的测量来估计晶体管的注射效率与基区输运系数是有疑问的。文中指出在电路设计中应用Early电压必须十分谨慎。
This paper investigates the physical dependence of the Early voltages VA(I)and VA(V) of a bipolar junction transistor having an arbitrary base doping distribution. A simple expression for the relationship between VA(I) and VA(V) is obtained. The current dependency of VA(V) is also given which shows that VA(V) will begin to decrease at a little high injection and can be less than VA(t) due to the bass correction factor. It is pointed out that it seems doubtful to determine the dominant mechnaism limiting the current amplification factor from the measured output conductances
owing to not only the variation of VA(V) but also the existence of the doping-profile-dependent correction factor.
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