我们取消了τ
n
=τ
p
的条件
取消了无限吸收的限制
考虑了表面复合
得到了本征光导器件探测率D
4
的表达式。 在本文得到的D公式中
出现了τ
PEM
但公式中这个量的影响很小
完全可以略去。 计算表明
77°K、P型InSb光导器件
在通常的表面复合速度下
最佳厚度约3μm。D
A
随多数载流子浓度的降低而增高
但由于背景限制
过低的浓度非但困难
也无必要。
In this work
we derived the formula of Dλ* of intrinsic photocon
under conditions of which τn=τp and the restriction on infinite optical absorption had been removed
but the effect of the surface recombination was taken into account.The τPEM appears in the Dλ* formula
but it’s influence
being very small
can be neglected.The calculation shows that
for normal surface recombination velocity
the optimum thickness of p-type InSb at 77°K is about 3μm. In addition
the detectivity of the sample mentioned above increases as the majority carrier concentration decreases. Owing to the BLIP limit
the excessive reduction of concentration is not only difficult but also unnecessary.
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