YON界面钝化层改善HfO<sub>2</sub>/Ge界面特性的研究

程智翔, 徐钦, 刘璐

Improvement of HfO₂/Ge Interface Properties by Using YON Interfacial Passivation Layer

CHENG Zhi-Xiang, XU Qin, LIU Lu

电子学报 . 2017, (11): 2810 -2814 . DOI: 10.3969/j.issn.0372-2112.2017.11.031