低介电常数(low-k)介质在ULSI中的应用前景
阮 刚;肖 夏;朱兆
Prospect on the Applicatoin of Low-k Dielectric in ULSI
RUAN Gang;XIAO Xia;ZHU Zhao-min
电子学报 . 2000, (11): 84 -87 .