1.南京邮电大学集成电路科学与工程学院,江苏南京 210023
2.南京邮电大学射频集成与微组装技术国家地方联合工程实验室,江苏南京 210023
[ "连晓娟 女,1985年4月出生,山西交城人.分别于2008年和2011年在西安电子科技大学获得工学学士和工学硕士学位,于2014年在西班牙巴塞罗那自治大学获得工学博士学位.目前任南京邮电大学集成电路科学与工程学院副教授、硕士生导师.主要研究方向为阻变存储器、相变存储器、忆阻神经形态器件的制备工艺、物理机制以及性能优化.E-mail: xjlian@njupt.edu.cn" ]
[ "高志瑄 男,1995年2月出生,天津人. 2017年本科毕业于天津理工大学电气工程及其自动化专业.2020年进入南京邮电大学电子信息专业攻读硕士学位.主要研究方向为集成电路与微纳器件.E-mail: 1220024217@njupt.edu.cn" ]
[ "付金科 男,1999年1月出生,湖北随州人.2020年本科毕业于南京邮电大学电子科学与技术系,其后继续在南京邮电大学微电子系攻读硕士学位.主要研究方向为非易失性存储器及其在类脑计算上的应用.E-mail: 1220024213@njupt.edu.cn" ]
[ "王磊(通讯作者) 男,1980年10月出生,江西南昌人.2003年、2004年和2009年分别在北京科技大学、曼彻斯特大学和埃克塞特大学获得工学学士、工学硕士和工学博士学位.现为南京邮电大学集成电路科学与工程学院教授、硕士生导师.IEEE会员.主要研究方向为基于非易失性器件的类脑光电存储器及神经网络." ]
收稿:2021-11-19,
修回:2022-02-14,
纸质出版:2023-02-25
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连晓娟,高志瑄,付金科等.基于刀片型限制结构的相变存储器阵列的热串扰效应研究[J].电子学报,2023,51(02):396-405.
LIAN Xiao-juan,GAO Zhi-xuan,FU Jin-ke,et al.Thermal Disturbance Effect of Phase Change Random Access Memory Array Based on Blade-Type Structure[J].ACTA ELECTRONICA SINICA,2023,51(02):396-405.
连晓娟,高志瑄,付金科等.基于刀片型限制结构的相变存储器阵列的热串扰效应研究[J].电子学报,2023,51(02):396-405. DOI: 10.12263/DZXB.20211548.
LIAN Xiao-juan,GAO Zhi-xuan,FU Jin-ke,et al.Thermal Disturbance Effect of Phase Change Random Access Memory Array Based on Blade-Type Structure[J].ACTA ELECTRONICA SINICA,2023,51(02):396-405. DOI: 10.12263/DZXB.20211548.
大数据时代的到来,对高密度存储和计算的速度、功耗提出了更高的要求.相变存储器由于具有较短的读取延迟和良好的可扩展性,在存储和计算领域中具有广阔的应用前景.将相变存储器扩展为高密度存储阵列时所产生的热串扰现象是目前阵列集成所面临的重要挑战,而热串扰所产生的干扰热量会进一步传递到相邻单元并使其发生误操作,导致存储器阵列的可靠性、准确性和稳定性受到影响.因此,本文针对一种新型刀片型结构的
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相变存储器阵列在激活状态下的热串扰现象进行了系统研究,通过仿真计算软件Comsol Multiphysics系统研究了新型刀片型结构的相变存储器阵列对热串扰的敏感性,并探讨了器件单元间距、器件结构尺寸、编程脉冲以及阵列的缩放效应对存储器阵列在工作时所产生的热串扰效应及其功耗的影响.研究结果显示:基于新型刀片型结构的相变存储器阵列,即使将其缩放到20 nm的技术节点,在5 nm的器件单元间距下仍可保持较低的最大热串扰温度.此外本文对阵列单元外部的绝缘层材料进行了改进,通过使用较高热导系数的AlN薄膜来代替SiO
2
薄膜,在存储器阵列功耗几乎保持不变的情况下进一步有效抑制了热串扰效应,使其最大热串扰温度下降了12.3%.该研究成果对未来基于相变存储器的高密度存储和计算阵列的集成具有非常重要的指导意义.
With the advent of the era of big data
higher requirements are put forward for high density storage
computing speed and power consumption. Phase-change random access memory (PCRAM) has been considered as one of the most promising candidates for future non-volatile storage applications due to its short-read delay and good scalability. The high-density integration of memory array is indispensable for its rapid commercial applications. The thermal disturbance (TDB) effect caused by the expansion of PCRAM cell into high density storage array is an important challenge for array integration. The interference heat generated will be further transferred to the adjacent cells to make them operation mistake and affect their reliability
accuracy and stability of the storage array. Therefore
in this paper
the TDB effect of a
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PCRAM array that is based on a new blade-type structure is systematically studied by using Comsol Multiphysics simulation software. We further discuss the relationship between the TDB effect and the space of storage cell
the size of device structure
the programming pulse and the scaling effect of PCRAM array. The results show that even when a blade-type structure based PCRAM array is scaled to a 20 nm technology node
the effect of TDB still remains low at a 5 nm device cell spacing. In addition
we optimize the insulating layer material outside the cell device by using AlN film with higher thermal conductivity than SiO
2
film. The TDB is further effectively suppressed while the power consumption of PCRAM array is basically unchanged
and the maximum temperature of TDB decreases by 12.3%. This work has very important guiding significance for the integration of high-density storage PCRAM arrays in the future.
ZHANG Y X , ZHOU Y Z . Transparent computing: Spatio-temporal extension on von Neumann architecture for cloud services [J]. Tsinghua Science and Technology , 2013 , 18 ( 1 ): 10 - 21 .
JAISWAL A , CHAKRABORTY I , AGRAWAL A , et al . 8T SRAM cell as a multibit dot-product engine for beyond von Neumann computing [J]. IEEE Transactions on Very Large Scale Integration Systems , 2019 , 27 ( 11 ): 2556 - 2567 .
IELMINI D , WONG H S P . In-memory computing with resistive switching devices [J]. Nature Electronics , 2018 , 1 ( 6 ): 333 - 343 .
冒伟 , 刘景宁 , 童薇 , 等 . 基于相变存储器的存储技术研究综述 [J]. 计算机学报 , 2015 , 38 ( 5 ): 944 - 960 .
MAO W , LIU J N , TONG W , et al . A review of storage technology research based on phase change memory [J]. Chinese Journal of Computers , 2015 , 38 ( 5 ): 944 - 960 . (in Chinese)
CHANTHBOUALA A , GARCIA V , CHERIFI R O , et al . A ferroelectric memristor [J]. Nature Materials , 2012 , 11 ( 10 ): 860 - 864 .
王玮 , 陈晋 , 余林峰 , 等 . 两类阻变机理及性能改善方法的研究 [J]. 电子学报 , 2017 , 45 ( 4 ): 989 - 999 .
WANG W , CHEN J , YU L F , et al . A research of two kinds of mechanism and performance improvement of resistive switching access memory [J]. Acta Electronica Sinica , 2017 , 45 ( 4 ): 989 - 999 . (in Chinese)
TEHRANI S , SLAUGHTER J M , CHEN E , et al . Progress and outlook for MRAM technology [J]. IEEE Transactions on Magnetics , 1999 , 35 ( 5 ): 2814 - 2819 .
田曼曼 , 王国祥 , 沈祥 , 等 . ZnSb掺杂的Ge 2 Sb 2 Te 5 薄膜的相变性能研究 [J]. 物理学报 , 2015 , 64 ( 17 ): 293 - 300 .
TIAN M M , WANG G X , SHEN X , et al . Phase change properties of ZnSb-doped Ge 2 Sb 2 Te 5 films [J]. Acta Physica Sinica , 2015 , 64 ( 17 ): 293 - 300 . (in Chinese)
ZHANG W , GAO B , TANG J , et al . Neuro-inspired computing chips [J]. Nature Electronics , 2020 , 3 ( 7 ): 371 - 382 .
BEZ R . Chalcogenide PCM: a memory technology for next decade [C]// 2009 IEEE International Electron Devices Meeting . Baltimore : IEEE , 2009 : 1 - 4 .
PELLIZZER F , BENVENUTI A , GLEIXNER B , et al . A 90nm phase change memory technology for stand-alone non-volatile memory applications [C]// 2006 Symposium on VLSI Technology - Digest of Technical Papers . Honolulu : IEEE , 2006 : 122 - 123 .
SERVALLI G . A 45nm generation Phase Change Memory technology [C]// 2009 IEEE International Electron Devices Meeting . Baltimore : IEEE , 2009 : 1 - 4 .
OH J H , PARK J H , LIM Y S , et al . Full integration of highly manufacturable 512Mb PRAM based on 90nm technology [C]// 2006 International Electron Devices Meeting . San Francisco : IEEE , 2006 : 1 - 4 .
LACAITA A L , WOUTERS D J . Phase-change memories [J]. Physica Status Solidi (a) , 2008 , 205 ( 10 ): 2281 - 2297 .
SEBASTIAN A , LE GALLO M , KREBS D . Crystal growth within a phase change memory cell [J]. Nature Communications , 2014 , 5 : 4314 .
SALINGA M , CARRIA E , KALDENBACH A , et al . Measurement of crystal growth velocity in a melt-quenched phase-change material [J]. Nature Communications , 2013 , 4 : 2371 .
KIM S , LEE B , ASHEGHI M , et al . Thermal disturbance and its impact on reliability of phase-change memory studied by the micro-thermal stage [C]// 2010 IEEE International Reliability Physics Symposium . Anaheim : IEEE , 2010 : 99 - 103 .
WANG R J , JIANG L , ZHANG Y T , et al . SD-PCM: Constructing reliable super dense phase change memory under write disturbance [J]. ACM SIGARCH Computer Architecture News , 2015 , 50 ( 4 ): 19 - 31 .
JIANG L , ZHANG Y T , YANG J . Mitigating write disturbance in super-dense phase change memories [C]// 2014 44th Annual IEEE/IFIP International Conference on Dependable Systems and Networks . Atlanta : IEEE , 2014 : 216 - 227 .
LEE S H , KIM M S , DO G S , et al . Programming disturbance and cell scaling in phase change memory: For up to 16nm based 4F2 cell [C]// 2010 Symposium on VLSI Technology . Honolulu : IEEE , 2010 : 199 - 200 .
PIROVANO A , LACAITA A L , BENVENUTI A , et al . Scaling analysis of phase-change memory technology [C]// IEEE International Electron Devices Meeting . Washington : IEEE , 2003 : 29.6.1- 29 . 6 . 4 .
RUSSO U , IELMINI D , REDAELLI A , et al . Modeling of programming and read performance in phase-change memories—Part I: Cell optimization and scaling [J]. IEEE Transactions on Electron Devices , 2008 , 55 ( 2 ): 506 - 514 .
WEN J , WANG L . Interfacial resistance characterization for blade-type phase change random access memory [J]. IEEE Transactions on Electron Devices , 2020 , 67 ( 3 ): 968 - 975 .
JIN Q X , LIU B , LIU Y , et al . Three-dimensional simulations of RESET operation in phase-change random access memory with blade-type like phase change layer by finite element modeling [J]. Chinese Physics Letters , 2016 , 33 ( 9 ): 098502 .
LIAN X J , FU J K , GAO Z X , et al . Thermoelectric effects on amorphization process of blade-type phase change random access memory [J]. IEEE Transactions on Electron Devices , 2021 , 68 ( 12 ): 6139 - 6146 .
DESHMUKH S , YALON E , LIAN F F , et al . Temperature-dependent contact resistance to nonvolatile memory materials [J]. IEEE Transactions on Electron Devices , 2019 , 66 ( 9 ): 3816 - 3821 .
DURAI S , RAJ S , MANIVANNAN A . Impact of thermal boundary resistance on the performance and scaling of phase-change memory device [J]. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems , 2020 , 39 ( 9 ): 1834 - 1840 .
EVTUKH A , LITOVCHENKO V , SEMENENKO M , et al . Formation of conducting nanochannels in diamond-like carbon films [J]. Semiconductor Science and Technology , 2006 , 21 ( 9 ): 1326 - 1330 .
WRIGHT C D , ARMAND M , AZIZ M M . Terabit-per-square-inch data storage using phase-change media and scanning electrical nanoprobes [J]. IEEE Transactions on Nanotechnology , 2006 , 5 ( 1 ): 50 - 61 .
LYEO H K , CAHILL D G , LEE B S , et al . Thermal conductivity of phase-change material Ge 2 Sb 2 Te 5 [J]. Applied Physics Letters , 2006 , 89 ( 15 ): 151904 .
FARACLAS A , WILLIAMS N , GOKIRMAK A , et al . Modeling of set and reset operations of phase-change memory cells [J]. IEEE Electron Device Letters , 2011 , 32 ( 12 ): 1737 - 1739 .
LEE J , ASHEGHI M , GOODSON K E . Impact of thermoelectric phenomena on phase-change memory performance metrics and scaling [J]. Nanotechnology , 2012 , 23 ( 20 ): 205201 .
HUANG D Q , MIAO X S , LI Z , et al . Nonthermal phase transition in phase change memory cells induced by picosecond electric pulse [J]. Applied Physics Letters , 2011 , 98 ( 24 ): 242106 .
FARACLAS A , BAKAN G , ADNANE L , et al . Modeling of thermoelectric effects in phase change memory cells [J]. IEEE Transactions on Electron Devices , 2014 , 61 ( 2 ): 372 - 378 .
WANG D W , ZHAO W S , CHEN W C , et al . Parallel simulation of fully coupled electrothermal processes in large-scale phase-change memory arrays [J]. IEEE Transactions on Electron Devices , 2019 , 66 ( 12 ): 5117 - 5125 .
ZHOU W Y , WU L C , ZHOU X L , et al . High thermal stability and low density variation of carbon-doped Ge 2 Sb 2 Te 5 for phase-change memory application [J]. Applied Physics Letters , 2014 , 105 ( 24 ): 243113 .
YOO S , LEE H D , LEE S , et al . Electro-thermal model for thermal disturbance in cross-point phase-change memory [J]. IEEE Transactions on Electron Devices , 2020 , 67 ( 4 ): 1454 - 1459 .
KIM T , LEE S . Evolution of phase-change memory for the storage-class memory and beyond [J]. IEEE Transactions on Electron Devices , 2020 , 67 ( 4 ): 1394 - 1406 .
KIM I S , CHO S L , IM D H , et al . High performance PRAM cell scalable to sub-20nm technology with below 4F2 cell size, extendable to DRAM applications [C]// 2010 Symposium on VLSI Technology . Honolulu : IEEE , 2010 : 203 - 204 .
CHOI Y , SONG I , PARK M H , et al. A 20nm 1 . 8 V 8 Gb PRAM with 40MB/s program bandwidth[C]// 2012 IEEE International Solid-State Circuits Conference . San Francisco : IEEE , 2012: 46 - 48 .
SON K , CHO K , KIM S , et al . Signal integrity design and analysis of 3-D X-point memory considering crosstalk and IR drop for higher performance computing [J]. IEEE Transactions on Components , Packaging and Manufacturing Technology , 2020 , 10 ( 5 ): 858 - 869 .
RUSSO U , IELMINI D , REDAELLI A , et al . Modeling of programming and read performance in phase-change memories - Part II: Program disturb and mixed-scaling approach [J]. IEEE Transactions on Electron Devices , 2008 , 55 ( 2 ): 515 - 522 .
CHOI S R , KIM D , CHOA S H , et al . Thermal conductivity of AlN and SiC thin films [J]. International Journal of Thermophysics , 2006 , 27 ( 3 ): 896 - 905 .
KOLESKE D D , FIGIEL J J , ALLIMAN D L , et al . Metalorganic vapor phase epitaxy of AlN on sapphire with low etch pit density [J]. Applied Physics Letters , 2017 , 110 ( 23 ): 232102 .
HUANG L G , LI Y , WANG W L , et al . Growth of high-quality AlN epitaxial film by optimizing the Si substrate surface [J]. Applied Surface Science , 2018 , 435 : 163 - 169 .
ZOLLNER C J , ALMOGBEL A , YAO Y F , et al . Reduced dislocation density and residual tension in AlN grown on SiC by metalorganic chemical vapor deposition [J]. Applied Physics Letters , 2019 , 115 ( 16 ): 161101 .
HE C G , ZHAO W , WU H L , et al . High-quality AlN film grown on sputtered AlN/sapphire via growth-mode modification [J]. Crystal Growth & Design , 2018 , 18 ( 11 ): 6816 - 6823 .
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